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Proceedings Paper

Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection
Author(s): Yutaka Nagata; Tetsuo Harada; Masato Nakasuji; Hiroo Kinoshita; Katsumi Midorikawa
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Paper Abstract

We have developed the standalone, coherent scatterometry microscope (CSM) for the inspection of extreme ultraviolet (EUV) lithography mask. The low divergence, coherent high-order harmonic (HH) was generated as coherent light source for CSM at a wavelength of 13.5 nm using a commercial laser system. The HH enable us to obtain the high contrast diffraction image from the mask. The diffraction light from the 2-nm wide line-defect and tens-nm size point-defects in the mask has been observed successfully with the system.

Paper Details

Date Published: 30 September 2013
PDF: 8 pages
Proc. SPIE 8849, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications X, 884914 (30 September 2013); doi: 10.1117/12.2023880
Show Author Affiliations
Yutaka Nagata, RIKEN (Japan)
Univ. of Hyogo (Japan)
JST CREST (Japan)
Tetsuo Harada, Univ. of Hyogo (Japan)
JST CREST (Japan)
Masato Nakasuji, Univ. of Hyogo (Japan)
JST CREST (Japan)
Hiroo Kinoshita, RIKEN (Japan)
Univ. of Hyogo (Japan)
JST CREST (Japan)
Katsumi Midorikawa, RIKEN (Japan)


Published in SPIE Proceedings Vol. 8849:
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications X
Annie Klisnick; Carmen S. Menoni, Editor(s)

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