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Proceedings Paper

Multifractality and the effect of turbulence on the chaotic dynamics of a HeNe laser
Author(s): Damián Gulich; Luciano Zunino; Darío Pérez; Mario Garavaglia
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Paper Abstract

We propose the use of multifractal detrended fluctuation analysis (MF-DFA) to measure the influence of atmospheric turbulence on the chaotic dynamics of a HeNe laser. Fit ranges for MF-DFA are obtained with goodness of linear fit (GoLF) criterion. The chaotic behavior is generated by means of a simple interferometric setup with a feedback to the cavity of the gas laser. Such dynamics have been studied in the past and modeled as a function of the feedback level. Different intensities of isotropic turbulence have been generated with a turbulator device, allowing a structure constant for the index of refraction of air adjustable by means of a temperature difference parameter in the unit. Considering the recent interest in message encryption with this kind of setups, the study of atmospheric turbulence effects plays a key role in the field of secure laser communication through the atmosphere. In principle, different intensities of turbulence may be interpreted as different levels of white noise on the original chaotic series. These results can be of utility for performance optimization in chaotic free-space laser communication systems.

Paper Details

Date Published: 25 September 2013
PDF: 13 pages
Proc. SPIE 8874, Laser Communication and Propagation through the Atmosphere and Oceans II, 88740J (25 September 2013); doi: 10.1117/12.2023708
Show Author Affiliations
Damián Gulich, Ctr. de Investigaciones Ópticas (Argentina)
Univ. Nacional de La Plata (Argentina)
Luciano Zunino, Ctr. de Investigaciones Ópticas (Argentina)
Univ. Nacional de La Plata (Argentina)
Darío Pérez, Pontificia Univ. Católica de Valparaíso (Chile)
Mario Garavaglia, Ctr. de Investigaciones Ópticas (Argentina)
Univ. Nacional de La Plata (Argentina)


Published in SPIE Proceedings Vol. 8874:
Laser Communication and Propagation through the Atmosphere and Oceans II
Alexander M. J. van Eijk; Christopher C. Davis; Stephen M. Hammel, Editor(s)

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