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Proceedings Paper

Atom lithography with subwavelength resolution
Author(s): M. Suhail Zubairy; Zeyang Liao; M. Al-Amri
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Paper Abstract

The resolutions of the optical lithography is limited by the well-known Rayleigh limit. Although the atom lithography can generate features smaller than this limit, the spacing of the pattern is still limited by the optical wavelength. Here, we proposed two atom lithography methods, both of which used the coherent Rabi oscillation to break the diffraction limit. One is in the microwave regime where the Rydberg atom is used and micrometer resolution can be achieved. The other is in the optical regime where sub-10 nanometer resolution is possible.

Paper Details

Date Published: 26 September 2013
PDF: 11 pages
Proc. SPIE 8875, Quantum Communications and Quantum Imaging XI, 887504 (26 September 2013); doi: 10.1117/12.2023234
Show Author Affiliations
M. Suhail Zubairy, Texas A&M Univ. (United States)
Zeyang Liao, Texas A&M Univ. (United States)
M. Al-Amri, Texas A&M Univ. (United States)
KACST (Saudi Arabia)

Published in SPIE Proceedings Vol. 8875:
Quantum Communications and Quantum Imaging XI
Ronald E. Meyers; Yanhua Shih; Keith S. Deacon, Editor(s)

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