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A silicon template with a high aspect ratio nanoscale structure realized by a two-step etching method for a stamping technique
Author(s): Dae-Seon Kim; Dong-Hyun Kim; Sungbae Lee; Jae-Hyung Jang
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Proc. SPIE 8824, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV, 88240Y; doi: 10.1117/12.2023013
Show Author Affiliations
Dae-Seon Kim, GIST (Korea, Republic of)
Dong-Hyun Kim, GIST (Korea, Republic of)
Sungbae Lee, GIST (Korea, Republic of)
Jae-Hyung Jang, GIST (Korea, Republic of)


Published in SPIE Proceedings Vol. 8824:
Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV
Oleg V. Sulima; Gavin Conibeer, Editor(s)

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