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Proceedings Paper

Fast hologram pattern generation by wave field translation
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Paper Abstract

In this paper, we present a fast hologram pattern generation method to overcome accumulation problem of point source based method. Proposed method consists of two steps. In the first step, 2D projection of wave field for 3D object is calculated by radial symmetric interpolation (RSI) method to the multiple reference depth planes. Then in the second step, each 2D wave field is translated toward SLM plane by FFT based algorithm. Final hologram pattern is obtained by adding them. The effectiveness of method is proved by computer simulation and optical experiment. Experimental results show that proposed method is 3878 times faster than analytic method, and 226 times faster than RSI method.

Paper Details

Date Published: 26 September 2013
PDF: 7 pages
Proc. SPIE 8855, Optics and Photonics for Information Processing VII, 885508 (26 September 2013); doi: 10.1117/12.2022810
Show Author Affiliations
S. Lee, Samsung Electronics, Co., Ltd. (Korea, Republic of)
H. C. Wey, Samsung Electronics, Co., Ltd. (Korea, Republic of)
D. K. Nam, Samsung Electronics, Co., Ltd. (Korea, Republic of)
D. S. Park, Samsung Electronics, Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8855:
Optics and Photonics for Information Processing VII
Khan M. Iftekharuddin; Abdul A. S. Awwal; Andrés Márquez, Editor(s)

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