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Proceedings Paper

Mueller matrix characterization using spectral reflectometry
Author(s): Dror Shafir; Gilad Barak; Michal Haim Yachini; Matthew Sendelbach; Cornel Bozdog; Shay Wolfling
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Paper Abstract

The fast evolution of microelectronics fabrication technology demands a concurrent development in metrology capabilities. In recent years, Mueller Matrix (MM) scatterometry has been asserted as a useful tool in characterizing critical dimensions (CD) in periodical arrays of nanometer-size structures. Specifically, some symmetry properties of the measured structure can be readily extracted from the MM, allowing effective isolation of abnormal features. One example is measuring deviations of grating structures from perfect mirror symmetry, characteristic of faults in the fabrication process. The most general form of the Muller matrix requires 16 independent measurements, and requires spectral ellipsometry. However, using some very general assumptions on the reflection properties of the measured sample, one can reduce this number considerably. Such realistic assumptions are time independence of the reflection properties, and homogeneity of the sample (i.e., constant reflectivity throughout the measurement spot), as is the common case in optical CD metrology targets. We show that under these assumptions the Mueller matrix can be completely measured using spectral reflectometry. The goal of characterizing asymmetry is then further analyzed, and a new approach for such measurement, based on spectral reflectometry, is presented. Specifically, using spectral differences metrology (SDM), this approach is shown to provide a simpler means to measure the same asymmetry-dependent quantity as targeted today using MM metrology, but requires only two distinct measurements leading to improved throughput.

Paper Details

Date Published: 13 May 2013
PDF: 9 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878903 (13 May 2013); doi: 10.1117/12.2022549
Show Author Affiliations
Dror Shafir, Nova Measuring Instruments, Ltd. (Israel)
Gilad Barak, Nova Measuring Instruments, Ltd. (Israel)
Michal Haim Yachini, Nova Measuring Instruments, Ltd. (Israel)
Matthew Sendelbach, Nova Measuring Instruments, Inc. (United States)
Cornel Bozdog, Nova Measuring Instruments, Inc. (United States)
Shay Wolfling, Nova Measuring Instruments, Ltd. (Israel)

Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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