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Proceedings Paper

Biomimetic antireflective AlInP nanostructures fabricated by lithography-free method for solar cell applications
Author(s): Chan Il Yeo; Joon Beom Kim; Kwang Wook Park; Yong Tak Lee
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Paper Abstract

We present biomimetic antireflective AlInP nanostructures fabricated by inductively coupled plasma etching using Ag etch masks, which were easily formed by spin-coating Ag ink and subsequent sintering process on a hotplate without any lithography process and complicated equipments, for compound semiconductor based solar cell applications. This lithography-free technique is a simple, cost-effective, and high throughput method. The fabricated AlInP nanostructures demonstrated drastically reduced the hemispherical reflectance and solar-weighted reflectance (SWR) compared to that of bulk AlInP in the wavelength range of 300-870 nm. The incident angle-dependent SWR of the AlInP nanostructures remained below 4% up to an incident angle of 50°. Therefore, the biomimetic antireflective AlInP nanostructures fabricated by using the lithography-free method hold great potential for use in compound semiconductor based solar cell applications.

Paper Details

Date Published: 25 September 2013
PDF: 6 pages
Proc. SPIE 8824, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV, 88240X (25 September 2013); doi: 10.1117/12.2022507
Show Author Affiliations
Chan Il Yeo, Gwangju Institute of Science and Technology (Korea, Republic of)
Joon Beom Kim, Gwangju Institute of Science and Technology (Korea, Republic of)
Kwang Wook Park, Gwangju Institute of Science and Technology (Korea, Republic of)
Yong Tak Lee, Gwangju Institute of Science and Technology (Korea, Republic of)


Published in SPIE Proceedings Vol. 8824:
Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV
Oleg V. Sulima; Gavin Conibeer, Editor(s)

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