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Proceedings Paper

Plasma etching of chrome masks using PBS resist
Author(s): Guido Bell; H. Spierer
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Paper Details

Date Published: 1 June 1990
PDF: 6 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20225
Show Author Affiliations
Guido Bell, BMP Plasmatechnologie GmbH (Germany)
H. Spierer, Siemens AG (Germany)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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