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Proceedings Paper

Plasma etching of chrome masks using PBS resist
Author(s): Guido Bell; H. Spierer
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Paper Abstract

Standard PBS can be used as a plasma etch mask. In the three layer system PBS /antireflective chrome oxide! chrome the PBS layer only exhibits a strong dependency on temperature. PBS is stabilized by cooling whereas the etch rates of chrome oxide and chrome remain practically unaffected by lowering the temperature. The resulting edge slope of the chrome is thus a function of etch rates of the three layers. A selectivity of 1:1:1 (PBS:CrxOy:Cr) leads to the reproduction of the starting PBS slope into the CrO/Cr slope. Therefore standard PBS structures with the usual flat foot of the Srn-shaped slope need a strong descum step prior to plasma etching.

Paper Details

Date Published: 1 June 1990
PDF: 6 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20225
Show Author Affiliations
Guido Bell, BMP Plasmatechnologie GmbH (Germany)
H. Spierer, Siemens AG (Germany)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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