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Proceedings Paper

Characterizing the focus of a multilayer coated off-axis parabola for FLASH beam at λ = 4.3 nm
Author(s): Adam F. G. Leontowich; Andrew Aquila; Francesco Stellato; Richard Bean; Holger Fleckenstein; Mauro Prasciolu; Mengning Liang; Daniel P. DePonte; Anton Barty; Fenglin Wang; Jakob Andreasson; Janos Hajdu; Henry N. Chapman; Saša Bajt
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Paper Abstract

A super-polished substrate with an off-axis parabola figure was coated with a Sc/B4C/Cr multilayer. This optic was used to focus pulses of 4.3 nm photons from the Free-electron LASer in Hamburg (FLASH) at normal incidence. Beam imprints were made in poly(methyl methacrylate) to align the optic and to measure the beam profile at the focal plane. The intense interaction resulted in imprints with raised perimeters, surrounded by ablated material extending out several micrometres. These features interfere with the beam profile measurement. The effect of a post-exposure development step on the beam imprints was investigated.

Paper Details

Date Published: 3 May 2013
PDF: 8 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 87770T (3 May 2013); doi: 10.1117/12.2022403
Show Author Affiliations
Adam F. G. Leontowich, Deutsches Elektronen-Synchrotron (Germany)
Andrew Aquila, European XFEL GmbH (Germany)
Francesco Stellato, Deutsches Elektronen-Synchrotron (Germany)
Richard Bean, Deutsches Elektronen-Synchrotron (Germany)
Holger Fleckenstein, Deutsches Elektronen-Synchrotron (Germany)
Mauro Prasciolu, Deutsches Elektronen-Synchrotron (Germany)
Mengning Liang, Deutsches Elektronen-Synchrotron (Germany)
Daniel P. DePonte, Deutsches Elektronen-Synchrotron (Germany)
Anton Barty, Deutsches Elektronen-Synchrotron (Germany)
Fenglin Wang, Deutsches Elektronen-Synchrotron (Germany)
Jakob Andreasson, Uppsala Univ. (Sweden)
Janos Hajdu, Uppsala Univ. (Sweden)
Henry N. Chapman, Deutsches Elektronen-Synchrotron (Germany)
Univ. Hamburg (Germany)
Saša Bajt, Deutsches Elektronen-Synchrotron (Germany)

Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

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