Share Email Print

Proceedings Paper

Recent advances in prepellicle mask cleaning
Author(s): Bert F. Plambeck; Mark D. Cerio; James A. Reynolds
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 June 1990
PDF: 15 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20224
Show Author Affiliations
Bert F. Plambeck, DuPont Photomasks (United States)
Mark D. Cerio, DuPont Photomasks (United States)
James A. Reynolds, Reynolds Consulting (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

© SPIE. Terms of Use
Back to Top