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Proceedings Paper

Recent advances in prepellicle mask cleaning
Author(s): Bert F. Plambeck; Mark D. Cerio; James A. Reynolds
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Paper Details

Date Published: 1 June 1990
PDF: 15 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20224
Show Author Affiliations
Bert F. Plambeck, DuPont Photomasks (United States)
Mark D. Cerio, DuPont Photomasks (United States)
James A. Reynolds, Reynolds Consulting (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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