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Proceedings Paper

Simulation of scattering effects in photolithography
Author(s): A. J. W. Tol; Graeme D. Maxwell; H. Paul Urbach; Robert Jan Visser
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Paper Details

Date Published: 1 June 1990
PDF: 15 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20223
Show Author Affiliations
A. J. W. Tol, Philips Research Labs. (Netherlands)
Graeme D. Maxwell, Philips Research Labs. (Netherlands)
H. Paul Urbach, Philips Research Labs. (Netherlands)
Robert Jan Visser, Philips Research Labs. (Netherlands)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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