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Proceedings Paper

New indexes of the 0.5-um resolution resist for optical lithography
Author(s): Aritoshi Sugimoto; Tetsuo Ito; Sadao Okano; Masahiro Nozaki; Takeshi Kato; Kazuyuki Suko; Masayasu Tsunematsu; Kazuya Kadota
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Paper Abstract

New indexes to evaluate and simulate the resolution power of the UV resists based on the dissolution rate curve as it relates to local inhibitor concentration are proposed. Optical parameters and the dissolution rate curve of commercially available resists were measured and studied to show their effect on the resolution power. The optical parameters A B and C had very little effect on the resolution power while the dissolution rate curve greatly effected the resolution power. Two indexes are extracted from the dissolution rate curve. One is the contrast of the dissolution rate and the other is the range of the dissolution rate. By using these indexes the resolution power can be easily described. The indexes of an imaginary resist required for a 0. 5. tm process is shown. 1 .

Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20218
Show Author Affiliations
Aritoshi Sugimoto, Hitachi Ltd. (Japan)
Tetsuo Ito, Hitachi Ltd. (Japan)
Sadao Okano, Hitachi Ltd. (Japan)
Masahiro Nozaki, Hitachi Ltd. (Japan)
Takeshi Kato, Hitachi Ltd. (Japan)
Kazuyuki Suko, Hitachi Ltd. (Japan)
Masayasu Tsunematsu, Hitachi Ltd. (Japan)
Kazuya Kadota, Hitachi Ltd. (Japan)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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