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Proceedings Paper

New indexes of the 0.5-um resolution resist for optical lithography
Author(s): Aritoshi Sugimoto; Tetsuo Ito; Sadao Okano; Masahiro Nozaki; Takeshi Kato; Kazuyuki Suko; Masayasu Tsunematsu; Kazuya Kadota
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Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20218
Show Author Affiliations
Aritoshi Sugimoto, Hitachi Ltd. (Japan)
Tetsuo Ito, Hitachi Ltd. (Japan)
Sadao Okano, Hitachi Ltd. (Japan)
Masahiro Nozaki, Hitachi Ltd. (Japan)
Takeshi Kato, Hitachi Ltd. (Japan)
Kazuyuki Suko, Hitachi Ltd. (Japan)
Masayasu Tsunematsu, Hitachi Ltd. (Japan)
Kazuya Kadota, Hitachi Ltd. (Japan)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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