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Proceedings Paper

Optical waveguides formed by carbon implantation on SiO2
Author(s): Erick Flores-Romero; José M. Zarate-Reyes; Héctor Silva-Pereyra; Alicia Oliver; Luis Rodríguez-Fernández
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Paper Abstract

The formation of planar optical waveguides by the implantation of carbon ions on fused quartz (SiO2) is presented. The implantation was performed at normal incidence by carbon ions accelerated at energies between 3 – 9 MeV, varying the fluences from 1.0×1014 to 2.3×1016 ions/cm2. The changes of the refractive index in the host were studied by the m-line method. With this method the effective refractive indices of the dark modes of the waveguides were measured, and then a refractive index profile was adjusted to fit the experimental indices. A refractive index enhancement was found in both regions dominated by the ion electronic stopping and nuclear stopping regimes. This indicates that the damage region created is surrounded by two zones with lower refractive index and can acts as a conventional planar optical waveguide. The dependence of the refractive index profiles respects to the implantation parameters like energy, fluence and current density, is also presented.

Paper Details

Date Published: 18 November 2013
PDF: 6 pages
Proc. SPIE 8785, 8th Iberoamerican Optics Meeting and 11th Latin American Meeting on Optics, Lasers, and Applications, 8785AM (18 November 2013); doi: 10.1117/12.2021719
Show Author Affiliations
Erick Flores-Romero, Univ. Nacional Autónoma de México (Mexico)
José M. Zarate-Reyes, Univ. Nacional Autónoma de México (Mexico)
Héctor Silva-Pereyra, Univ. Nacional Autónoma de México (Mexico)
Alicia Oliver, Univ. Nacional Autónoma de México (Mexico)
Luis Rodríguez-Fernández, Univ. Nacional Autónoma de México (Mexico)


Published in SPIE Proceedings Vol. 8785:
8th Iberoamerican Optics Meeting and 11th Latin American Meeting on Optics, Lasers, and Applications
Manuel Filipe P. C. Martins Costa, Editor(s)

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