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Proceedings Paper

Optimal binary image design for optical lithography
Author(s): Yong Liu; Avideh Zakhor
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Paper Abstract

we apply combinatorial optimization techniques to binary mask design for optical lithography. The mask is optimized in such a way as to pre-compensate the distortions due to diffraction of the optical system. Mean squared error (MSE) criterion is used to formulate the problem as a binary linear programming (LP) one which is then solved via branch and bound and simplex algorithms. Variation of the optimal mask as a function of the optical system bandwidth is discussed. Examples involving corners squares bars and crosses are presented. 1.

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20216
Show Author Affiliations
Yong Liu, Univ. of California/Berkeley (United States)
Avideh Zakhor, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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