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Proceedings Paper

Optimal binary image design for optical lithography
Author(s): Yong Liu; Avideh Zakhor
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Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20216
Show Author Affiliations
Yong Liu, Univ. of California/Berkeley (United States)
Avideh Zakhor, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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