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Proceedings Paper

Slumping of Si wafers at high temperature
Author(s): M. Mika; O. Jankovsky; P. Simek; O. Lutyakov; R. Havlikova; Z. Sofer; R. Hudec; L. Pina; A. Inneman; L. Sveda; V. Marsikova
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Paper Abstract

Space X-ray imaging telescopes have delivered unique observations that have been significantly contributing to many important discoveries of current astrophysics. For future telescopes with a larger collecting area and a better angular resolution, the limiting factor is their X-ray reflecting mirror array. Therefore, for a successful construction of future lightweight and highly reflecting X-ray mirrors, new cost-effective technologies and progressive materials are needed. Currently, the very promising materials are silicon foils which are commercially produced on a large scale. We focused on the plastic deformation of thin monocrystalline silicon foils, which was necessary for the precise thermal forming of the foils to 3D shapes. To achieve the plastic deformation, we applied forced slumping at temperatures from 1200 to 1400°C. The final shapes and the surface quality of the foils were measured using a Taylor Hobson contact profilometer and examined with an Atomic Forced Microscopy. We studied the effects of temperature, applied slumping force, heattreatment time, crystal orientation, and furnace atmosphere on the shape and surface quality of the formed foils.

Paper Details

Date Published: 9 May 2013
PDF: 7 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 87770Z (9 May 2013); doi: 10.1117/12.2021586
Show Author Affiliations
M. Mika, Institute of Chemical Technology (Czech Republic)
O. Jankovsky, Institute of Chemical Technology (Czech Republic)
P. Simek, Institute of Chemical Technology (Czech Republic)
O. Lutyakov, Institute of Chemical Technology (Czech Republic)
R. Havlikova, Czech Technical Univ. in Prague (Czech Republic)
Z. Sofer, Institute of Chemical Technology (Czech Republic)
R. Hudec, Astronomical Institute of the ASCR, v.v.i. (Czech Republic)
L. Pina, Czech Technical Univ. in Prague (Czech Republic)
A. Inneman, Rigaku Innovative Technologies Europe s.r.o (Czech Republic)
L. Sveda, Czech Technical Univ. in Prague (Czech Republic)
V. Marsikova, Rigaku Innovative Technologies Europe s.r.o (Czech Republic)


Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

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