Share Email Print

Proceedings Paper

Extending immersion lithography down to 1x nm production nodes
Author(s): Wim P. de Boeij; Remi Pieternella; Igor Bouchoms; Martijn Leenders; Marjan Hoofman; Roelof de Graaf; Haico Kok; Par Broman; Joost Smits; Jan-Jaap Kuit; Matthew McLaren
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this paper we report on the performance enhancements on the NXT immersion scanner platform to support the immersion lithography roadmap. We particular discuss scanner modules that enable future overlay and focus requirements. Among others we describe the improvements in grid calibrations and grid matching; thermal control of reticle heating with dynamic systems adjustments; aberration tuning and FlexWave-lens heating control as well as aberration- and overlay-metrology on wafer-2-wafer timescales. Finally we address reduction of leveling process dependencies, stage servo dynamics and wafer table flatness to enhance on-product focus and leveling performance. We present and discuss module- and system-data of the above mentioned scanner improvements.

Paper Details

Date Published: 12 April 2013
PDF: 9 pages
Proc. SPIE 8683, Optical Microlithography XXVI, 86831L (12 April 2013); doi: 10.1117/12.2021397
Show Author Affiliations
Wim P. de Boeij, ASML Netherlands B.V. (Netherlands)
Remi Pieternella, ASML Netherlands B.V. (Netherlands)
Igor Bouchoms, ASML Netherlands B.V. (Netherlands)
Martijn Leenders, ASML Netherlands B.V. (Netherlands)
Marjan Hoofman, ASML Netherlands B.V. (Netherlands)
Roelof de Graaf, ASML Netherlands B.V. (Netherlands)
Haico Kok, ASML Netherlands B.V. (Netherlands)
Par Broman, ASML Netherlands B.V. (Netherlands)
Joost Smits, ASML Netherlands B.V. (Netherlands)
Jan-Jaap Kuit, ASML Netherlands B.V. (Netherlands)
Matthew McLaren, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 8683:
Optical Microlithography XXVI
Will Conley, Editor(s)

© SPIE. Terms of Use
Back to Top