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Proceedings Paper

Modeling latent image formation in photolithography using the Helmholtz equation
Author(s): H. Paul Urbach; Douglas A. Bernard
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Paper Abstract

A novel method for simulating latent image formation in a photoresist illuminated by partially coherent light is described. Starting with an accurate procedure for discretizing the extended incoherent light source into sufficiently many point sources the fields incident on the resist corresponding to these sources are calculated. Then the latent image is calculated by repeatedly solving a boundary value problem for the Helmholtz equation using the finite element method. The characteristics of this method which is particularly suitable for the simulation of bumpy interfaces are discussed. The dependence of developed image on defocus is then investigated for the case of high NA. The obtained results are compared with those predicted by the vertical propagation and the first order models. The applicability of the method to bumpy layers is also illustrated. 1.

Paper Details

Date Published: 1 June 1990
PDF: 16 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20211
Show Author Affiliations
H. Paul Urbach, Philips Research Labs. (Netherlands)
Douglas A. Bernard, Philips Research Labs. (Netherlands)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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