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Proceedings Paper

Pixel length calibration using a pattern matching method for secondary-electron images
Author(s): Kentaro Sugawara; Ichiko Misumi; Satoshi Gonda
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Paper Abstract

We developed a calibration method using a pattern matching method for the SEM equipped with laser interferometer units at an X-Y sample stage. By comparing two images captured before and after the stage movement, an each of moving pixel number to X and Y direction were analyzed using the image processing technique. Then the pixel length was calibrated using stage position data and the pixel data. The developed calibration methods were applied to nano-particle measurements. The sample particle sizes were nominal diameter of 100 nm and 300 nm. Measurement uncertainty evaluation was done and quantitatively reliable results were obtained.

Paper Details

Date Published: 22 June 2013
PDF: 6 pages
Proc. SPIE 8769, International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013), 876909 (22 June 2013); doi: 10.1117/12.2021086
Show Author Affiliations
Kentaro Sugawara, AIST (Japan)
Ichiko Misumi, AIST (Japan)
Satoshi Gonda, AIST (Japan)


Published in SPIE Proceedings Vol. 8769:
International Conference on Optics in Precision Engineering and Nanotechnology (icOPEN2013)
Chenggen Quan; Kemao Qian; Anand Asundi, Editor(s)

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