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Proceedings Paper

Deep-UV wafer stepper with through-the-lens wafer to reticle alignment
Author(s): Stefan Wittekoek; Martin A. van den Brink; Henk F.D. Linders; Judon M. D. Stoeldraijer; J. W.D. Martens; Douglas R. Ritchie
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Paper Details

Date Published: 1 June 1990
PDF: 14 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20207
Show Author Affiliations
Stefan Wittekoek, ASM-Lithography, B.V. (Netherlands)
Martin A. van den Brink, ASM-Lithography, B.V. (Netherlands)
Henk F.D. Linders, ASM-Lithography, B.V. (Netherlands)
Judon M. D. Stoeldraijer, ASM-Lithography, B.V. (Netherlands)
J. W.D. Martens, ASM-Lithography, B.V. (Netherlands)
Douglas R. Ritchie, ASM-Lithography, B.V. (Netherlands)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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