Share Email Print
cover

Proceedings Paper

S-Genius, a universal software platform with versatile inverse problem resolution for scatterometry
Author(s): David Fuard; Nicolas Troscompt; Ismael El Kalyoubi; Sébastien Soulan; Maxime Besacier
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

S-Genius is a new universal scatterometry platform, which gathers all the LTM-CNRS know-how regarding the rigorous electromagnetic computation and several inverse problem solver solutions. This software platform is built to be a userfriendly, light, swift, accurate, user-oriented scatterometry tool, compatible with any ellipsometric measurements to fit and any types of pattern. It aims to combine a set of inverse problem solver capabilities — via adapted Levenberg- Marquard optimization, Kriging, Neural Network solutions — that greatly improve the reliability and the velocity of the solution determination. Furthermore, as the model solution is mainly vulnerable to materials optical properties, S-Genius may be coupled with an innovative material refractive indices determination. This paper will a little bit more focuses on the modified Levenberg-Marquardt optimization, one of the indirect method solver built up in parallel with the total SGenius software coding by yours truly. This modified Levenberg-Marquardt optimization corresponds to a Newton algorithm with an adapted damping parameter regarding the definition domains of the optimized parameters. Currently, S-Genius is technically ready for scientific collaboration, python-powered, multi-platform (windows/linux/macOS), multi-core, ready for 2D- (infinite features along the direction perpendicular to the incident plane), conical, and 3D-features computation, compatible with all kinds of input data from any possible ellipsometers (angle or wavelength resolved) or reflectometers, and widely used in our laboratory for resist trimming studies, etching features characterization (such as complex stack) or nano-imprint lithography measurements for instance. The work about kriging solver, neural network solver and material refractive indices determination is done (or about to) by other LTM members and about to be integrated on S-Genius platform.

Paper Details

Date Published: 13 May 2013
PDF: 9 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878919 (13 May 2013); doi: 10.1117/12.2020674
Show Author Affiliations
David Fuard, LTM-CNRS, UJF, INPG (France)
CEA-LETI Minatec (France)
Nicolas Troscompt, LTM-CNRS, UJF, INPG (France)
CEA-LETI Minatec (France)
Ismael El Kalyoubi, LTM-CNRS, UJF, INPG (France)
CEA-LETI Minatec (France)
Sébastien Soulan, LTM-CNRS, UJF, INPG (France)
CEA-LETI Minatec (France)
Maxime Besacier, LTM-CNRS, UJF, INPG (France)
CEA-LETI Minatec (France)


Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

© SPIE. Terms of Use
Back to Top