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Proceedings Paper

Scatterometry sensitivity analysis for conical diffraction versus in-plane diffraction geometry with respect to the side wall angle
Author(s): Victor Soltwisch; Sven Burger; Frank Scholze
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Paper Abstract

Extreme W scatterometry using radiation in the extreme ultraviolet photon energy range, with wavelengths around 13.5 nm, provides direct information on the performance of EUV optical components, e.g. EUV pho­ tomasks, in their working wavelength regime. Scatterometry with horizontal diffraction geometry, parallel to the grating lines (conical), and vertical scattering geometry, perpendicular to the lines (in-plane), was performed on EUV lithography mask test structures. Numerical FEM based simulations, using a rigorous Maxwell solver, compare both experimental set-ups with focus on the sensitivity of the diffraction intensities particularly with respect to the side wall angle.

Paper Details

Date Published: 13 May 2013
PDF: 10 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 878905 (13 May 2013); doi: 10.1117/12.2020487
Show Author Affiliations
Victor Soltwisch, Physikalisch-Technische Bundesanstalt (Germany)
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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