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Proceedings Paper

Effect of laser conditioning on the LIDT of 532nm HfO2/SiO2 reflectors
Author(s): Jie Liu; Xu Li; Zhenkun Yu; Hui Cui; Weili Zhang; Meiping Zhu; Kui Yi
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Paper Abstract

The laser-induced damage threshold (LIDT) of optical thin film is influenced by certain preconditioning processes. HfO2/SiO2 532nm high reflective multi-layers were prepared by electron beam evaporation and were preconditioned by 532nm laser. The 532nm LIDT, surface condition, and damage morphology of the sample were characterized and compared before and after laser conditioning process. Results are presented that the LIDT of e-beam deposited multilayer HfO2/SiO2 thin films can be increased after laser conditioning. Possible reasons for such enhancement have been analyzed.

Paper Details

Date Published: 9 July 2013
PDF: 6 pages
Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 87860Z (9 July 2013); doi: 10.1117/12.2020439
Show Author Affiliations
Jie Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Xu Li, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Zhenkun Yu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Hui Cui, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Weili Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Kui Yi, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 8786:
Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers
Jianda Shao; Takahisa Jitsuno; Wolfgang Rudolph, Editor(s)

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