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Proceedings Paper

Effect of central obscuration on image formation in projection lithography
Author(s): Steven T. Yang; Robert L. Hsieh; Y.-H. Lee; Roger Fabian W. Pease; Gerry Owen
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Paper Abstract

Central obscuration of the pupil is a prominent feature of many high performance reflective designs being considered for sub-200nm lithography. The performance of centrally-obscured designs were investigated using computer simulations of projected image intensity and major features from simulation were experimentally confirmed. The effect of partially-coherent illumination on centrally-obscured systems was studied and an optimized annular illumination system is proposed. 1.

Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20203
Show Author Affiliations
Steven T. Yang, Stanford Univ. (United States)
Robert L. Hsieh, Stanford Univ. (United States)
Y.-H. Lee, Stanford Univ. (United States)
Roger Fabian W. Pease, Stanford Univ. (United States)
Gerry Owen, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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