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Proceedings Paper

Evaluation of resists using ArF excimer laser projection lithography
Author(s): Masaru Sasago; Yoshiyuki Tani; Masayuki Endo; Noboru Nomura
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Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20202
Show Author Affiliations
Masaru Sasago, Matsushita Electric Industrial Co., Ltd. (Japan)
Yoshiyuki Tani, Matsushita Electric Industrial Co., Ltd. (Japan)
Masayuki Endo, Matsushita Electric Industrial Co., Ltd. (Japan)
Noboru Nomura, Matsushita Electric Industrial Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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