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Proceedings Paper

Application of EUV optics to surface modification of materials
Author(s): O. Frolov; K. Kolacek; J. Straus; J. Schmidt; V. Prukner; A. Choukourov
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Paper Abstract

We report results of experiments connected with surface modification of materials with an intense extreme ultraviolet (EUV) laser beam. Irradiated by the laser beam from a discharge-plasma EUV source (with wavelength of 46.9 nm) based on a high-current capillary discharge driver, the samples have been investigated by atomic-force microscope (AFM). The laser beam is focused with a spherical Si/Sc multilayer-coated mirror on polymethylmethacrylate (PMMA), gold-covered- PMMA and gallium arsenide (GaAs) samples. It turned out that desorption and ablation regimes, which are observed in all these cases strongly depends on substrate materials.

Paper Details

Date Published: 3 May 2013
PDF: 7 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877707 (3 May 2013); doi: 10.1117/12.2020158
Show Author Affiliations
O. Frolov, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)
K. Kolacek, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)
J. Straus, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)
J. Schmidt, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)
V. Prukner, Institute of Plasma Physics of the ASCR, v.v.i. (Czech Republic)
A. Choukourov, Charles Univ. in Prague (Czech Republic)


Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

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