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Proceedings Paper

Evaluating pattern transfer lenses for deep-UV laser-induced processes
Author(s): Gerhard Solaro; Erich Keckeis; Friedrich G. Bachmann
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Paper Details

Date Published: 1 June 1990
PDF: 10 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20201
Show Author Affiliations
Gerhard Solaro, Siemens AG (Germany)
Erich Keckeis, Siemens AG (Germany)
Friedrich G. Bachmann, Siemens AG (Germany)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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