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Proceedings Paper

Comprehensive 3-D notching simulator with nonplanar substrates
Author(s): Eytan Barouch; Brian D. Bradie; Uwe Hollerbach; George Karniadakis; Steven A. Orszag
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Paper Details

Date Published: 1 June 1990
PDF: 9 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20198
Show Author Affiliations
Eytan Barouch, Clarkson Univ. (United States)
Brian D. Bradie, Clarkson Univ. (United States)
Uwe Hollerbach, Princeton Univ. (United States)
George Karniadakis, Princeton Univ. (United States)
Steven A. Orszag, Princeton Univ. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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