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Proceedings Paper

Investigation of reflective notching with massively parallel simulation
Author(s): Karim H. Tadros; Andrew R. Neureuther; John Kenneth Gamelin; Roberto Guerrieri
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Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20197
Show Author Affiliations
Karim H. Tadros, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)
John Kenneth Gamelin, Univ. of California/Berkeley (United States)
Roberto Guerrieri, Univ. di Bologna (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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