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Proceedings Paper

Photolithography simulation on nonplanar substrates
Author(s): Michael S. Yeung
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Paper Details

Date Published: 1 June 1990
PDF: 13 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20196
Show Author Affiliations
Michael S. Yeung, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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