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Proceedings Paper

Algorithm for optimizing stepper performance through image manipulation
Author(s): Chris A. Mack
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Paper Abstract

The advent offlexible steppers allowing variation in the numericalaperture partial coherence and possibly other optical parameters allows new opportunities for optimization. Thispaper wilidiscuss a methodforpicking the optimum numerical aperture and partial coherence for a given mask pattern and focus budget. An algorithm will beproposedforfinding the optimum values. This algorithm could be used as a controllerfor an intelligent stepper

Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20195
Show Author Affiliations
Chris A. Mack, Dept. of Defense (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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