Share Email Print
cover

Proceedings Paper

Enhanced structures for through-the-lens alignment with DUV lithography
Author(s): Andrew P. Sabersky; Robert J. Naber; Kevin G. Riddell
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 June 1990
PDF: 13 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20194
Show Author Affiliations
Andrew P. Sabersky, Ultratech Stepper Corp. (United States)
Robert J. Naber, Ultratech Stepper Corp. (United States)
Kevin G. Riddell, Ultratech Stepper Corp. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

© SPIE. Terms of Use
Back to Top