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Proceedings Paper

Enhanced structures for through-the-lens alignment with DUV lithography
Author(s): Andrew P. Sabersky; Robert J. Naber; Kevin G. Riddell
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Paper Details

Date Published: 1 June 1990
PDF: 13 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20194
Show Author Affiliations
Andrew P. Sabersky, Ultratech Stepper Corp. (United States)
Robert J. Naber, Ultratech Stepper Corp. (United States)
Kevin G. Riddell, Ultratech Stepper Corp. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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