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Proceedings Paper

0.10-um overlay for DRAM production using step and scan
Author(s): Harry Sewell; Scott J. Smith; Daniel N. Galburt
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Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20193
Show Author Affiliations
Harry Sewell, Perkin-Elmer Corp. (United States)
Scott J. Smith, Perkin-Elmer Corp. (United States)
Daniel N. Galburt, Perkin-Elmer Corp. (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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