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Proceedings Paper

0.10-um overlay for DRAM production using step and scan
Author(s): Harry Sewell; Scott J. Smith; Daniel N. Galburt
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Paper Abstract

The resolution capabilities of lithographic tools are being progressively pushed to allow the replication of increasingly smaller lithographic features1'2 The target for 0.5-micron resolution is almost past; 0.4-micron resolution is of keen interest; and the goal of 0.35 micron is just around the corner. The overlay requirements using the familiar rule of thumb of Overlay = Resolution I 4 indicates that a 0.10-micron (mean plus 3 sigma) specification is required for 0.40-micron resolution tools. This is not an easy task. We will explore it in the context of a Step-and-Scan' alignment system.

Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20193
Show Author Affiliations
Harry Sewell, Perkin-Elmer Corp. (United States)
Scott J. Smith, Perkin-Elmer Corp. (United States)
Daniel N. Galburt, Perkin-Elmer Corp. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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