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Proceedings Paper

Evaluation of a silicon trench alignment target strategy
Author(s): Gary E. Flores; Warren W. Flack
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Paper Details

Date Published: 1 June 1990
PDF: 15 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20191
Show Author Affiliations
Gary E. Flores, TRW, Inc. (United States)
Warren W. Flack, TRW, Inc. (United States)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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