Share Email Print
cover

Proceedings Paper

Responses of organic and inorganic materials to intense EUV radiation from laser-produced plasmas
Author(s): Tetsuya Makimura; Shuichi Torii; Daisuke Nakamura; Akihiko Takahashi; Tatsuo Okada; Hiroyuki Niino; Kouichi Murakami
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We have investigated responses of polymers to EUV radiation from laser-produced plasmas beyond ablation thresholds and micromachining. We concentrated on fabricate precise 3D micro-structures of PDMS, PMMA, acrylic block copolymers (BCP), and silica. The micromachining technique can be applied to three-dimensional micro-fluidic and bio-medical devices. The EUV processing is a promising to realize a practical micromachining technique. In the present work, we used two EUV radiation sources; (a) Wide band EUV light in a range of 10{300 eV was generated by irradiation of Ta targets with Nd:YAG laser light at 500 mJ/pulse. (b) Narrow band EUV light at 11 and 13 nm was generated by irradiation of solid Xe and Sn targets, respectively, with pulsed TEA CO2 laser light. The generated EUV light was condensed onto the materials at high power density beyond the ablation thresholds, using ellipsoidal mirrors. We found that through-holes with a diameter of one micrometer an be fabricated in PMMA and PDMS sheets with thicknesses of 4-10 micrometers, at 250 and 230 nm/shot, respectively. The effective ablation of PMMA sheets can be applied to a LIGA-like process for fabricating micro-structures of metals for micro- and nano-molds. PDMS sheets are ablated if it is irradiated with EUV light beyond a distinct threshold power density, while PDMS surfaces were modified at lower power densities. Furthermore, BCP sheets were ablated to have 1-micrometer structures. Thus, we have developed a practical technique for micromachining of PMMA, PDMS and BCP sheets in a micrometer scale.

Paper Details

Date Published: 9 May 2013
PDF: 13 pages
Proc. SPIE 8777, Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III, 877706 (9 May 2013); doi: 10.1117/12.2019048
Show Author Affiliations
Tetsuya Makimura, Univ. of Tsukuba (Japan)
Shuichi Torii, Univ. of Tsukuba (Japan)
Daisuke Nakamura, Kyushu Univ. (Japan)
Akihiko Takahashi, Kyushu Univ. (Japan)
Tatsuo Okada, Kyushu Univ. (Japan)
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Kouichi Murakami, Univ. of Tsukuba (Japan)


Published in SPIE Proceedings Vol. 8777:
Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
Libor Juha; René Hudec; Ladislav Pina; Saša Bajt; Richard London, Editor(s)

© SPIE. Terms of Use
Back to Top