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Proceedings Paper

Modeling of optical alignment and metrology schemes used in integrated circuit manufacturing
Author(s): Chi-Min Yuan; Andrzej J. Strojwas
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Paper Details

Date Published: 1 June 1990
PDF: 16 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20189
Show Author Affiliations
Chi-Min Yuan, Carnegie Mellon Univ. (United States)
Andrzej J. Strojwas, Carnegie Mellon Univ. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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