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Proceedings Paper

New phase-shifting mask with highly transparent SiO2 phase shifters
Author(s): Isamu Hanyu; Satoru Asai; Kinjiro Kosemura; Hiroshi Ito; Mitsuji Nunokawa; Masayuki Abe
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Paper Details

Date Published: 1 June 1990
PDF: 11 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20187
Show Author Affiliations
Isamu Hanyu, Fujitsu Labs. Ltd. (Japan)
Satoru Asai, Fujitsu Labs. Ltd. (Japan)
Kinjiro Kosemura, Fujitsu Labs. Ltd. (Japan)
Hiroshi Ito, Fujitsu Labs. Ltd. (Japan)
Mitsuji Nunokawa, Fujitsu Labs. Ltd. (Japan)
Masayuki Abe, Fujitsu Labs. Ltd. (Japan)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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