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Proceedings Paper

Optical emission spectroscopy analysis for Ge2Sb2Te5 etching endpoint detection in HBr/He plasma
Author(s): Juntao Li; Bo Liu; Zhitang Song; Gaoming Feng; Guanping Wu; Aodong He; Zuoya Yang; Nanfei Zhu; Jia Xu; Jiadong Ren; Songlin Feng
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Paper Abstract

In the fabrication of phase change memory devices, HBr/He gas is employed in patterning Ge2Sb2Te5 (GST) because it is damage free to GST sidewall. Accurate and reproducible endpoint detection methods are necessary in this etching process. In-situ optical emission spectroscopy (OES) is collected and analyzed to control the GST etching process due to its non-invasiveness. By analyzing the light emitted from plasma, we report an effective etch endpoint detection method for GST etching process is developed and the results are also confirmed using scanning electron micrographs.

Paper Details

Date Published: 24 January 2013
PDF: 4 pages
Proc. SPIE 8782, 2012 International Workshop on Information Storage and Ninth International Symposium on Optical Storage, 87820L (24 January 2013); doi: 10.1117/12.2018658
Show Author Affiliations
Juntao Li, Shanghai Institute of Microsystem and Information Technology (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Bo Liu, Shanghai Institute of Microsystem and Information Technology (China)
Zhitang Song, Shanghai Institute of Microsystem and Information Technology (China)
Gaoming Feng, Semiconductor Manufacturing International Corp. (China)
Guanping Wu, Semiconductor Manufacturing International Corp. (China)
Aodong He, Shanghai Institute of Microsystem and Information Technology (China)
Graduate Univ. of Chinese Academy of Sciences (China)
Zuoya Yang, Semiconductor Manufacturing International Corp. (China)
Nanfei Zhu, Semiconductor Manufacturing International Corp. (China)
Jia Xu, Semiconductor Manufacturing International Corp. (China)
Jiadong Ren, Semiconductor Manufacturing International Corp. (China)
Songlin Feng, Shanghai Institute of Microsystem and Information Technology (China)


Published in SPIE Proceedings Vol. 8782:
2012 International Workshop on Information Storage and Ninth International Symposium on Optical Storage
Fuxi Gan; Zhitang Song, Editor(s)

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