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Proceedings Paper

Coherent scattering stereoscopic microscopy for mask inspection of extreme ultra-violet lithography
Author(s): Ki-Hyuk Kim; Jung-Guen Jo; Min-Chul Park; Byeong-Kwon Ju; Sungjin Cho; Jung-Young Son
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Paper Abstract

Recently, mask inspection for extreme ultraviolet lithography has been in the spotlight as the next-generation lithography technique in the field of semiconductor production. This technology is used to make semiconductors more delicate even as they become tinier. In mask inspection, defect sizes and locations are major factors for aggravating mask defects which cause errors on wafer patterns. This paper addresses a simulated solution of coherent scattering stereoscopic microscopy for considering the mitigation of mask defects. To perform the inspection of mask defects for the stereoscopic microscopy, we construct a stereo aerial image with a disparity map produced by a Hybrid input-output algorithm and disparity estimation methods. Preliminary results show that mask inspection by coherent scattering stereoscopic microscopy is expected to be performed in a more accurate way compared to 2D mask inspection.

Paper Details

Date Published: 17 May 2013
PDF: 6 pages
Proc. SPIE 8738, Three-Dimensional Imaging, Visualization, and Display 2013, 87380Z (17 May 2013); doi: 10.1117/12.2018588
Show Author Affiliations
Ki-Hyuk Kim, Korea Institute of Science and Technology (Korea, Republic of)
Jung-Guen Jo, Korea Institute of Science and Technology (Korea, Republic of)
Korea Univ. (Korea, Republic of)
Min-Chul Park, Korea Institute of Science and Technology (Korea, Republic of)
Byeong-Kwon Ju, Korea Univ. (Korea, Republic of)
Sungjin Cho, Korea Institute of Science and Technology (Korea, Republic of)
Korea Univ. (Korea, Republic of)
Jung-Young Son, Konyang Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8738:
Three-Dimensional Imaging, Visualization, and Display 2013
Bahram Javidi; Jung-Young Son, Editor(s)

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