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Proceedings Paper

Dry etching for high-resolution maskmaking
Author(s): Serge V. Tedesco; Christophe Pierrat; Jean Michel Lamure; C. Sourd; Jean-Luc Martin; Jean Charles Guibert
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Paper Details

Date Published: 1 June 1990
PDF: 14 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20185
Show Author Affiliations
Serge V. Tedesco, LETI/CENG (France)
Christophe Pierrat, LETI/CENG (France)
Jean Michel Lamure, LETI/CENG (France)
C. Sourd, LETI/CENG (France)
Jean-Luc Martin, LETI/CENG (France)
Jean Charles Guibert, LETI/CENG (France)

Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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