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Proceedings Paper

0.5-um photolithography using high-numerical-aperture I-line wafer steppers
Author(s): William H. Arnold; Anna Maria Minvielle; Khoi A. Phan; Bhanwar Singh; Michael K. Templeton
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Paper Details

Date Published: 1 June 1990
PDF: 16 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20184
Show Author Affiliations
William H. Arnold, Advanced Micro Devices, Inc. (United States)
Anna Maria Minvielle, Advanced Micro Devices, Inc. (United States)
Khoi A. Phan, Advanced Micro Devices, Inc. (United States)
Bhanwar Singh, Advanced Micro Devices, Inc. (United States)
Michael K. Templeton, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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