Share Email Print
cover

Proceedings Paper

High-numerical-aperture I-line stepper
Author(s): Barton A. Katz; James S. Greeneich; Mark G. Bigelow; Ann Katz; Frits J. van Hout; Jos F. Coolsen
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

I-line stepper technology is described which features a new generation high NA lens and an improved implementation of a phase grating alignment system. Combining the high NA lens with high contrast resist processing enables O.5um processing to be supported with good process latitude and CD control without adverse effects due to lens heating. Alignment technology compatible with advanced processing is described. Overlay data taken from several steppers shows less than lOOnm capability which is sufficient to support O.5um design rules. Further advancements in Iline processing technology to O.41um are described which allows this technology to be used in developing advanced products.

Paper Details

Date Published: 1 June 1990
PDF: 33 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20183
Show Author Affiliations
Barton A. Katz, ASM Lithography, Inc. (United States)
James S. Greeneich, ASM Lithography, Inc. (United States)
Mark G. Bigelow, ASM Lithography, Inc. (United States)
Ann Katz, ASM Lithography, Inc. (United States)
Frits J. van Hout, ASM Lithography, B.V. (Netherlands)
Jos F. Coolsen, ASM Lithography, B.V. (Netherlands)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

© SPIE. Terms of Use
Back to Top