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Proceedings Paper

Molecular glass photoresists based on 9,9'-spirobifluorene derivatives: Synthesis and application in EUV photolithography
Author(s): Yi Li; Qingshan Hao; Jinping Chen; Tianjun Yu
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Date Published:
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Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867933; doi: 10.1117/12.2018242
Show Author Affiliations
Yi Li, Technical Institute of Physics and Chemistry (China)
Qingshan Hao, Technical Institute of Physics and Chemistry (China)
Jinping Chen, Technical Institute of Physics and Chemistry (China)
Tianjun Yu, Technical Institute of Physics and Chemistry (China)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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