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Proceedings Paper

Defect parameters retrieval based on optical projection images
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Paper Abstract

Defect parameters retrieval from diffraction-limited images is demonstrated. The parameters of defects in nanostructures are retrieved from measured aerial images of high NA-projection systems. The difference between images of masks with and without defects is used as a reference to reconstruct the parameters of the defect. An error function is defined, and the whole retrieval procedure can be expressed as an optimization problem. The performance of the technique was simulated by the lithography and imaging simulator Dr.LiTHO. The dependencies of the retrieval results on optimizers, illumination settings, defect sizes, and reference images are presented. The evaluation of the performance of the technique is performed by comparison of the retrieval errors for defect shapes, mask patterns, and types of noise. Moreover, the sensitivity of the defect detection to Zernike aberrations of the optical image projection lens and the retrieval accuracy for different mask models and types of defects are investigated.

Paper Details

Date Published: 22 May 2013
PDF: 12 pages
Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890J (22 May 2013); doi: 10.1117/12.2018210
Show Author Affiliations
Dongbo Xu, Friedrich-Alexander-Univ. Erlangen-Nürnberg (China)
Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Sikun Li, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate Univ. of the Chinese Academy of Sciences (China)
Tim Fühner, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Fraunhofer Institute for Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 8789:
Modeling Aspects in Optical Metrology IV
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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