Share Email Print
cover

Proceedings Paper

Image quality of higher NA I-line projection lens
Author(s): Shinichi Nakamura; Koichi Matsumoto; Kazuo Ushida; Masaomi Kameyama
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

These days much attention is being paid to the potential of i-line lithography. We have manufactured a high numer ical aperture ( N. A. ) i-lme lens in order to study this potential. The lens specification is as follows magnification : 1/10 N. A. : 0. 65 field size : 5X5min. In this paper we first compare the difference between the image quality of g-line and i-line optics with the same resolution and then we present the results of our experiment with the new i-line lens which shows the considerable P055 ibil ity of sub-half micron 1 ithography with an i-l me optical stepper. 1.

Paper Details

Date Published: 1 June 1990
PDF: 10 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20181
Show Author Affiliations
Shinichi Nakamura, Nikon Corp. (Japan)
Koichi Matsumoto, Nikon Corp. (Japan)
Kazuo Ushida, Nikon Corp. (Japan)
Masaomi Kameyama, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

© SPIE. Terms of Use
Back to Top