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Proceedings Paper

Deep-ultraviolet lithography for 500-nm devices
Author(s): Steven J. Holmes; Ruth Levy; Albert S. Bergendahl; Karey L. Holland; John G. Maltabes; Stephen E. Knight; Katherine C. Norris; Denis Poley
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Paper Details

Date Published: 1 June 1990
PDF: 10 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20180
Show Author Affiliations
Steven J. Holmes, IBM Corp. (United States)
Ruth Levy, IBM Corp. (United States)
Albert S. Bergendahl, IBM Corp. (United States)
Karey L. Holland, IBM Corp. (United States)
John G. Maltabes, IBM Corp. (United States)
Stephen E. Knight, IBM Corp. (United States)
Katherine C. Norris, IBM Corp. (United States)
Denis Poley, IBM Corp. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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