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Proceedings Paper

Thin-film, wide-angle, design-tunable, selective absorber from near UV to far infrared
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Paper Abstract

We experimentally demonstrate a structured thin film that selectively absorbs incident electromagnetic waves in discrete bands, which by design occur in any chosen range from near UV to far infrared. The structure consists of conducting islands separated from a conducting plane by a dielectric layer. By changing dimensions and materials, we have achieved broad absorption resonances centered at 0.36, 1.1, 14, and 53 microns wavelength. Angle-dependent specular reflectivity spectra are measured using UV-visible or Fourier spectrometers. The peak absorption ranges from 85 to 98%. The absorption resonances are explained using the model of an LCR resonant circuit created by coupling between dipolar plasma resonance in the surface structures and their image dipoles in the ground plane. The resonance wavelength is proportional to the dielectric permittivity and to the linear dimension of the surface structures. These absorbers have application to thermal detectors of electromagnetic radiation.

Paper Details

Date Published: 11 June 2013
PDF: 7 pages
Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87041D (11 June 2013); doi: 10.1117/12.2017958
Show Author Affiliations
Janardan Nath, Univ. of Central Florida (United States)
Douglas Maukonen, Univ. of Central Florida (United States)
Evan Smith, Univ. of Central Florida (United States)
Pedro Figueiredo, Univ. of Central Florida (United States)
Guy Zummo, Univ. of Central Florida (United States)
Deep Panjwani, Univ. of Central Florida (United States)
Robert E. Peale, Univ. of Central Florida (United States)
Glenn Boreman, Univ. of North Carolina at Charlotte (United States)
Justin W. Cleary, Air Force Research Lab. (United States)
Kurt Eyink, Air Force Research Lab. (United States)


Published in SPIE Proceedings Vol. 8704:
Infrared Technology and Applications XXXIX
Bjørn F. Andresen; Gabor F. Fulop; Charles M. Hanson; Paul R. Norton; Patrick Robert, Editor(s)

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