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Proceedings Paper

Characterization of an asymmetric nonlinear component of process induced distortion in thermally stressed silicon wafers
Author(s): Paul T. Herrington; Bruce E. Woolery
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Paper Details

Date Published: 1 June 1990
PDF: 7 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20179
Show Author Affiliations
Paul T. Herrington, Intel Corp. (United States)
Bruce E. Woolery, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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