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Proceedings Paper

Considerations on the focus latitude for G-line and DUV resists
Author(s): Ralph R. Dammel; Charlet R. Lindley; Winfried Meier; Georg Pawlowski; Juergen Theis; Wolfgang Henke
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Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20177
Show Author Affiliations
Ralph R. Dammel, Hoechst AG (Germany)
Charlet R. Lindley, Hoechst AG (Germany)
Winfried Meier, Hoechst AG (Germany)
Georg Pawlowski, Hoechst AG (Germany)
Juergen Theis, Hoechst AG (Germany)
Wolfgang Henke, Fraunhofer Institut fuer Mikrostrukturtechnik (Germany)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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