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Proceedings Paper

Phase-shifting mask and FLEX method for advanced photolithography
Author(s): Hiroshi Fukuda; Akira Imai; Shinji Okazaki
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Paper Details

Date Published: 1 June 1990
PDF: 12 pages
Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); doi: 10.1117/12.20176
Show Author Affiliations
Hiroshi Fukuda, Hitachi, Ltd. (Japan)
Akira Imai, Hitachi, Ltd. (Japan)
Shinji Okazaki, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 1264:
Optical/Laser Microlithography III
Victor Pol, Editor(s)

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