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Proceedings Paper

High-power EUV discharge-produced plasma source based on liquid tin jet electrodes
Author(s): Konstantin Koshelev; Vladimir M. Krivtsun; Oleg F. Yakushev; Alexander A. Lash; Aleksander Yu. Vinokhodov; Vladimir Mikhailovich Borisov; Alexander V. Prokofiev
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Paper Details

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Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867931; doi: 10.1117/12.2017518
Show Author Affiliations
Konstantin Koshelev, Institute of Spectroscopy (Russian Federation)
Vladimir M. Krivtsun, Institute of Spectroscopy (Russian Federation)
Oleg F. Yakushev, Institute of Spectroscopy (Russian Federation)
Alexander A. Lash, Institute of Spectroscopy (Russian Federation)
Aleksander Yu. Vinokhodov, Troitsk Institute for Innovation and Fusion Research (Russian Federation)
Vladimir Mikhailovich Borisov, Troitsk Institute for Innovation and Fusion Research (Russian Federation)
Alexander V. Prokofiev, Troitsk Institute for Innovation and Fusion Research (Russian Federation)


Published in SPIE Proceedings Vol. 8679:
Extreme Ultraviolet (EUV) Lithography IV
Patrick P. Naulleau, Editor(s)

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